DIRECTED SELF-ASSEMBLY OF BLOCK CO-POLYMERS FOR NANO-MANUFACTURING
Editora: WOODHEAD PUBLISHING
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Sinopse
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.
Ficha técnica
- Código de barras:
- 9780081002506
- Dimensões:
- 1.00cm x 16.00cm x 23.00cm
- Edição:
- 1ª EDIÇÃO - 2015
- Editora:
- WOODHEAD PUBLISHING
- ISBN:
- 9780081002506
- ISBN13:
- 9780081002506
- Número de páginas:
- 328
- Peso:
- 366 gramas
- Ano de publicação:
- 2016